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ASML GainsMinority Stake in Zeiss for EUV Development

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VELDHOVEN, Netherlands, Nov. 10, 2016 — Semiconductor supplier ASML Holding NV has announced an acquisition agreement to acquire a 24.9 percent minority stake in optics developer Carl Zeiss AG’s subsidiary Carl Zeiss SMT, for which ASML will pay Zeiss €1 billion ($1.09 billion) in cash. The agreement’s main objective is to facilitate the development of the future generation of extreme ultraviolet (EUV) lithography systems due in the first few years of the next decade. This technology will enable the semiconductor industry to produce much higher performance microchips at lower costs. ASML is a supplier...Read full article

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    Published: November 2016
    Glossary
    extreme ultraviolet
    Extreme ultraviolet (EUV) refers to a specific range of electromagnetic radiation in the ultraviolet part of the spectrum. EUV radiation has wavelengths between 10 and 124 nanometers, which corresponds to frequencies in the range of approximately 2.5 petahertz to 30 exahertz. This range is shorter in wavelength and higher in frequency compared to the far-ultraviolet and vacuum ultraviolet regions. Key points about EUV include: Source: EUV radiation is produced by extremely hot and energized...
    lithography
    Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
    ASML HoldingCarl Zeissextreme ultravioletEUVsemiconductorsmicrochipsEuropelithographyMicroscopyBusiness

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