Search
Menu
Deposition Sciences Inc. - Difficult Coatings - LB - 8/23

Excimer Lasers, High-NA Optics Push Lithography

Facebook X LinkedIn Email
Michael D. Wheeler

BALTIMORE -- Developments in excimer lasers and high numerical aperture optics technology are pushing photonics into the forefront of semiconductor microlithography, where laser-created feature sizes have already dipped below 0.25 µm.David Shaver of Massachusetts Institute of Technology's Lincoln Laboratory in Cambridge, Mass., told the CLEO '97 plenary audience that development of a generation of systems based on 193-nm ArF excimer lasers is under way. If they prove successful, feature sizes as small as 0.1 µm using phase-shift masking could become the industry standard.To further...Read full article

Related content from Photonics Media



    Articles


    Products


    Photonics Handbook Articles


    White Papers


    Webinars


    Photonics Dictionary Terms


    Media


    Photonics Buyers' Guide Categories


    Companies
    Published: July 1997
    CoatingsindustrialResearch & TechnologyTech Pulse

    We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.