2015 Topics will include: Mask Making, Anamorphic Masks for High-NA EUV, Emerging Mask Technologies, and Mask Business.
The 2015 Keynote Presentation will include Harry J. Levinson: Lithography and Mask Challenges at the Leading Edge.
2015 Special Sessions will include:
- EPE Computation in the Era of Multi-Patterning
- Mask Technologies for Alternative Lithography
- EUV Mask Readiness
- Student Session and Best Paper Awards—Calling All Students