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Photonics Spectra
Sep 2003
JEOL USA Inc.Request Info
 
JEOL USA Inc. By combining the SMI2000MS series focused ion beam (FIB) tool from Seiko and the JEM-2500SE scanning transmission electron microscope from JEOL USA Inc., the two companies have developed a high-throughput technique for preparing cross-sectional samples and imaging features smaller than 90 nm. Without destroying the wafer, the fully automated FIB prepares and finalizes multipoint specimens at specified locations on 200- or 300-mm wafers. A gallium-ion beam converts the specified cross section into a 100-nm layer. The microscope then produces images with resolution of 0.2 nm, which, according to the company, is five times the resolution of scanning electron microscope tools


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