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Photonics Spectra
Oct 2004
SCHOTT AG, Lithotec Div.
EUV REFLECTOMETER Schott Lithotec AG has installed a high-precision EUV reflectometer suitable for cleanrooms in its facility for the production of photomask blanks, enabling the qualification of EUV photomask blanks in-house for 32-nm node technology and below. The company says that the device provides high throughput, accuracy, sensitivity and reproducibility. It eliminates the need for external qualification at synchrotrons and fulfills the requirements for mass production of microchips in the EUV lithography market.

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