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PHASE MASKS

Photonics Spectra
Mar 2005
Ibsen Photonics A/SRequest Info
 
Ibsen Photonics A/S has announced 2-D phase masks for single-exposure production of square lattice grating structures. Featuring ±0.01-nm period accuracy, the masks allow one-step exposure of 2-D grating structures over large grating areas. They can be used with laser illumination or in a volume-production-oriented near-field holography mask aligner process. The masks are usable for grating periods from 200 to 687 nm and are optimized to operate under wavelengths from 193 to 435 nm. They are suitable for display technology, solar cells, photonic crystals, biochip matrices and semiconductor applications.


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Photonics Buyers' Guide
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biochip matricesenergyIbsen Photonics A/Slaser illuminationnear-field holography mask aligner processNew Productsphase masksphotonic crystalsResearch & Technologysemiconductor applicationssolar cells

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