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DEEP-UV LASER

Toptica Photonics AGRequest Info
 
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DEEP-UV LASER Toptica Photonics AG has released a deep-UV laser system that uses a two-stage approach to frequency-quadruple the output of IR laser diodes. Offered as an alternative to gas and dye lasers, the TA-FHG 110 is suitable for applications such as ellipsometry for materials analysis, photoelectron spectroscopy and microscopy, lithography, lens testing, mastering, glue curing and polymer hardening. The output wavelength is tunable from 205 to 270 nm, and the maximum output power is 15 mW at 243 nm. An automatic relock feature enables frequency scanning of more than 100 GHz. No water-cooled chiller is required.


Published: September 2005
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deep-UV laser systemindustrialIR laser diodesMicroscopyNew ProductsToptica Photonics AG

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