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Excimer Laser Mirrors
May 2006
Alpine Research OpticsRequest Info
BOULDER, Colo., May 30, 2006 -- Alpine Research Optics (ARO) has introduced a new series of high-performance flat mirrors intended for general purpose beam-steering tasks in ultraviolet excimer laser-based applications such as microlithography, micromachining, materials processing and Lasik. According to the company, these thin-film optics are specifically designed to deliver an optimum combination of high reflectivity, long lifetime, superior laser damage resistance and excellent mechanical durability.

AROMirrors.jpgThe ARO standard catalog product line is supplied on both 1-in. (25 mm) and 2-in. (50 mm) diameter fused silica substrates. These off-the-shelf products are available at all common excimer laser wavelengths (193 nm, 248 nm, 308 nm and 351 nm), in designs optimized for either 0° or 45° incidence. Additional specifications for these products are λ/10 surface flatness (over an 85% clear aperture) and a 10-5 surface quality.

For more information, visit:; e-mail:

Alpine Research Optics
6810 Winchester Cir.
Boulder, CO 80301
Phone: (303) 444-3420
Fax: (303) 444-1686
Web site:


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Alpine Research OpticsAROexcimer laserindustrialLASIKmicrolithographymicromachiningmirrorsopticsProductssilicathin-film

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