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EUV Spectrometer
Jan 2009
McPhersonRequest Info
CHELMSFORD, Mass., Jan. 12, 2009 – McPherson Inc. has released an x-ray and extreme ultraviolet (EUV) spectrometer, the 251MX, for wavelength dispersive spectral measurements from 0.6 to 20 nm (60 to 2000 eV.) The device provides corrected flat-field spectra with its selection of diffraction gratings. Data is acquired quickly and easily with direct-detection CCDs. The clean stainless steel chamber and vacuum-prepared internal components enable efficient pumping for high- or ultrahigh-vacuum (UHV) applications.

McPherson.jpgThe small footprint simplifies systems integration. The two available gratings, for 0.6 to 6 nm and 5 to 20 nm have square groove profiles. The laminar design helps reduce effects of high diffracted orders, and the corrected grating designs deliver high-resolution spectra.

The spectrometer advances laboratory soft x-ray and EUV spectral characterization and enables simultaneous spectral detection over a wide range. The dedicated optical geometry reduces calibration errors and increases the amount of data that can be collected in a given amount of time.

The stand-alone spectrograph is vacuum leak-tested and certified, and it is supplied with measured optical performance data in the wavelength region of interest. The turnkey integrated system includes pumps and a detector.

Applications include soft x-ray plasma diagnostics, analysis of high-order harmonic generated coherent EUV lasers, characterization of EUV sources for high-resolution imaging and fabrication of advanced semiconductor lithography processes.

For more information, visit:

McPherson Inc.
7A Stuart Road
Chelmsford MA 01824-4107
Phone: (978) 256-4512 (or 1-800-255-1055)
Fax: 978-250-8625





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Biophotonicsdirect-detection CCDsEUVextreme ultraviolet spectrometerflat-field spectrahigh-order harmonic generated coherent EUV lasershigh-resolution imagingindustriallaminar designMcPherson Inc.optical geometryphotonicsProductssemiconductor lithographySensors & DetectorsSpectrometerspectroscopyultrahigh-vacuum applicationsx-rayx-ray plasma diagnostics

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