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Matrix 355-1.5-70

Photonics.com
Jul 2009
Coherent Inc.Request Info
 
Ultraviolet laser
SANTA CLARA, Calif., July 8, 2009 – Coherent Inc. has expanded its family of Matrix solid-state Q-switched lasers with an ultraviolet model optimized to produce 1.5 W of average power at a repetition rate of 70 kHz to support high-throughput applications. In addition to high speed, the Matrix 355-1.5-70 delivers enhanced precision by enabling complete control over pulse energy and timing from the first to the last pulse. The pulse energy can be held constant as the repetition rate is varied. The cost/performance ratio of the laser is targeted at industrial processing applications where cost per processed unit is as important as reliable operation and stable parameters over time.

Coherent_-Matrix.jpgThe laser is fully RoHS-compliant and backed by an 18-mo/10,000-h warranty. It uses proprietary PermAlign solder-bonded optics mounting technology and long-life components such as Aluminum-Free Active Area pump diodes. Together with multipass harmonics generation technology, this results in long laser lifetime, low pulse-to-pulse noise of typically <2% rms, maximum pointing stability of ?15 µrad/°C and beam quality of M2 <1.3. Pulse duration is <30 ns. Maximum warm-up time from a cold start is <20 min and, from a warm start, <5 min.

Operating temperature is from 15 to 40 °C.

The laser’s assembly is robot-assisted. It is cleanroom-built and hermetically sealed.

It is suitable for use in stereolithography applications as well as for scribing sapphire substrates in GaN/InGaN-based LED production. Other applications include thin-film processing, memory repair, cold marking and semiconductor scribing.

For more information, visit: www.coherent.com  

Coherent Inc.
5100 Patrick Henry Drive
Santa Clara, CA 95054
Phone: (800) 527-3786
Fax: (800) 362-1170


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cleanroom-builtCoherentcold markinghermetically sealedindustrialMatrix 355-1.5-70memory repairPermAlign technologyphotonicsphotonics.comProductsQ-switchedrobotic assemblyRoHS-compliantscribing sapphire substratessemiconductor scribingsolid-statestereolithographythin-film processingultraviolet laserlasers

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