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Metrology System

Photonics Spectra
Oct 2009
Rudolph Technologies Inc.Request Info
 
RudolphTechnologies.jpgRudolph Technologies Inc. has unveiled the S3000S metrology system for in-line process control of advanced diffusion and fab-wide thin-film applications. The system enables simultaneous measurement with multiwavelength, multiangle focus beam ellipsometry and deep ultraviolet reflectometry, and is built on the Vanguard-II automation platform. A MAControl module, which provides one-step nondestructive removal of the molecular airborne contamination layer on thin films, is available as an option.


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advanced diffusionautomation platformdeep ultraviolet reflectometryenergyfab-widefocus beam ellipsometryin-line process controlMAControl modulemetrologymolecular airborne contaminationNew ProductsRudolph Technologies Inc.S3000S Metrology SystemTest & Measurementthin filmVanguard-II

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