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Electron Microscope Decontaminator

Photonics Spectra
Jun 2011
XEI Scientific Inc.Request Info
XEI Scientific Inc., manufacturer of the Evactron plasma cleaning system for electron microscopes and other vacuum chambers, has announced that the product can be used to clean carbon decontamination using hydrogen. According to the company, atomic hydrogen created by the Evactron plasma is effective in cleaning carbon contamination from extreme-ultraviolet (EUV) optics. For the semiconductor industry to continue making smaller features, lithographic systems are moving to shorter wavelengths such as EUV, and the very elaborate and expensive optics required may be damaged by oxygen cleaning. Using the plasma cleaning system with hydrogen gas has produced atomic hydrogen and been successful in removing hydrocarbon contamination from EUV mirrors. Cleaning rates were seen in the nanometers-per-minute range and at distances of up to 30 cm from the remote plasma source.


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Americasatomic hydrogenBasic ScienceCaliforniacarbon contaminationdecontaminator systemselectron microscopesEUV mirrorsEvactronextreme-ultraviolet opticslithographic systemsMicroscopymirrorsNew Productsopticsplasma cleaning systemplasmasvacuum chambersx-ray windowsXEI Scientific Inc.

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