Close

Search

Search Menu
Photonics Media Photonics Buyers' Guide Photonics EDU Photonics Spectra BioPhotonics EuroPhotonics Industrial Photonics Photonics Showcase Photonics ProdSpec Photonics Handbook
More News
share
Email Facebook Twitter Google+ LinkedIn

Scanning Electron Microscope

BioPhotonics
Feb 2012
Tescan USA Inc.Request Info
 
Tescan has unveiled the FERA3 XMH, a high-resolution Schottky field emission scanning electron microscope with an integrated plasma source focused ion beam (FIB). The system was developed in cooperation with Orsay Physics. Besides electron and ion columns, the microscope can be configured with gas injection systems, nanomanipulators, secondary electron and backscatter detectors, secondary ion detectors, cathodoluminescence detectors, and energy-dispersive and electron backscatter diffraction microanalyzers. The use of a xenon plasma source for the FIB allows the FERA3 to satisfy high-resolution FIB requirements (imaging) as well as to produce the high ion currents needed for ultrafast material removal rates. Applications include inspection of integrated circuit packaging, circuit edit, 3-D metrology, and defect and failure analysis.


REQUEST INFO ABOUT THIS PRODUCT

* Message:
(requirements, questions for supplier)
Your contact information
* First Name:
* Last Name:
* Email Address:
* Company:
Address:
Address 2:
City:
State/Province:
Postal Code:
* Country:
Phone #:
Fax #:

Register or login to auto-populate this form:
Login Register
* Required

When you click "Send Request", we will record and send your personal contact information to Tescan USA Inc. by email so they may respond directly. You also agree that Photonics Media may contact you with information related to this inquiry, and that you have read and accept our Privacy Policy and Terms and Conditions of Use.
BiophotonicsBreakthroughProductsCzech RepublicEuropeFERA3 XMH scanning electron microscopemetrologyMicroscopyopticsscanning electron microscope configured with secondary electron detectorsscanning electron microscope configured with secondary ion detectorsscanning electron microscope integrated plasma source focused ion beamscanning electron microscope semiconductor packagingSchottky field emission SEMSEM 3-D metrologySEM circuit editSEM configured with backscatter detectorsSEM configured with cathodoluminescence detectorsSEM configured with electron backscatter diffraction microanalyzersSEM configured with energy-dispersive microanalyzersSEM configured with gas injection systemsSEM configured with nanomanipulatorsSEM defect analysisSEM electron and ion columnsSEM failure analysisSEM inspection of IC packagingSEM removal of large volumes of materialSensors & DetectorsTescanTest & Measurement

Terms & Conditions Privacy Policy About Us Contact Us
back to top
Facebook Twitter Instagram LinkedIn YouTube RSS
©2018 Photonics Media, 100 West St., Pittsfield, MA, 01201 USA, info@photonics.com

Photonics Media, Laurin Publishing
x Subscribe to BioPhotonics magazine - FREE!
X
Are you interested in this product?
When you click "Send Request", we will send the contact details you supply to Tescan USA Inc. so they may respond to your inquiry directly.

Email Address:
Name:
Company:
Stop showing me this for the remainder of my visit
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.