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EUV Exposure Tool

Photonics.com
Jul 2016ASML NVRequest Info
 
VELDHOVEN, Netherlands, July 21, 2016 — ASML has announced the TWINSCAN NXE:3350B extreme UV (EUV) Exposure Tool.

More than 1200 wafers per day (wpd) are exposed on the NXE:3350B at a customer site, with peak performance of 1488 wpd. Five customer systems have achieved a four-week average availability of more than 80 percent.

The device prepares customers for manufacturing insertion.

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