Request InfoScientific Computing InternationalThe FilmTek 2000M-DUV thin-film metrology tool from Scientific Computing International is suitable for research and development and for volume production of 90-nm semiconductor devices. It can monitor wafers for 193-nm deep-UV lithography and can measure thickness and optical film properties simultaneously. Based on broadband spectrophotometry at wavelengths of 190 to 1700 nm, the system provides a measurement spot size as small as 5 µm in diameter. A proprietary algorithm enables full characterization of single- and multiple-layer films with thicknesses from 3 Å to 250 µm for...See full productRelated content from Photonics MediaPRODUCTSPhotonics.com 5/13/2022Metrology and Surface Imaging Software PlatformThe fully 64-bit TrueMap® 6 software platform for surface imaging and analysis from TrueGage contains multi-threaded algorithms, a redesigned user interface, and new capabilities. 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