Request InfoLogitech Ltd.Logitech says its CDP polishing machine produces laser-quality surfaces and improves surface topography. Designed for delayering and chemical mechanical polishing, the system allows nanometer-level removal on an individual die or on wafers up to 8 in. in diameter. It is suitable for applications such as hard-substrate polishing, epi-ready surface preparation and wafer reclamation. The CDP system, which can be used with acid and alkaline slurries, features a 20-in.-diameter processing plate, a wafer/die carrier and an independent conditioner head.See full productRelated content from Photonics MediaPRODUCTSPhotonics Spectra May 2023 IssueOptical ProfilometerThe NPFLEX-1000 optical profilometer from Bruker Corp. features large form-factor gantry and robust bridge architecture for fast, automated areal measurements of surface texture and roughness. ...Photonics Spectra April 2023 IssueIndustrial Picosecond LaserThe HyperRapid NXT industrial picosecond laser from Coherent Corp. features a 10-W average output power in the deep-UV to enable ultra-precise edge ablation for organic LED displays. 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