Request InfoRudolph Technologies Inc.Expert application system (Easy) software released by Rudolph Technologies Inc. enhances the capabilities of the company's MetaPulse and MetaPulse-II opaque film metrology line to cover 90-nm chip manufacturing processes. The software is suitable for applications including in-line electroplate edge profiling, residual copper/barrier detection after chemical mechanical planarization, and copper/interlevel dielectric dishing. Manufacturers can detect defects during production to avoid reduced yield of chips on the wafer's edge and to prevent chemical mechanical planarization-related problems....See full productRelated content from Photonics MediaPRODUCTSPhotonics Spectra April 2023 IssueLaser Phase Lock SystemThe OE5000 Hi-Q Laser Phase Lock System from OEwaves Inc. allows the offset locking of two individual lasers separated in frequency by as much as 50 GHz. 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