Request InfoCymer Inc.The XLA 105 argon-fluoride excimer light source manufactured by Cymer Inc. is designed to support 65-nm photolithography applications. Based on proprietary master oscillator power amplifier dual-gas-discharge-chamber technology, it is intended for volume production of semiconductor devices. It operates at a 4-kHz repetition rate and delivers 40 W of output to provide full imaging capability for 200- and 300-mm lithography scanners. Bandwidth is ≤0.2 pm FWHM and ≤0.50 pm at 95% energy integral. 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