Request InfoCymer Inc.Operating at a maximum repetition rate of 4 kHz and delivering up to 60 W of output power, Cymer Inc.'s XLA 200 excimer light source is designed for immersion lithography applications. The third-generation master-oscillator-power-amplifier-based ArF light source is engineered for the volume production of semiconductors at the 45-nm node. Bandwidth is ≤0.12 pm FWHM and ≤0.25 pm at 95% energy integral.See full productRelated content from Photonics MediaPRODUCTSPhotonics.com 6/7/2022UHD HDMI to SDI Converter ModuleThe NA4K2022 small-form-factor UHD HDMI to serial digital video (SDI) converter module from eVision Systems GmbH provides native signal processing with high image quality. Video input signals...Photonics.com 9/29/2023OEM Optical SwitchThe OSX-100E OEM Optical Switch from Santec is available in different sizes up to 80 channels with single-mode, multimode, polarization maintaining, or custom core sizes. 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