Request InfoMcPHERSONCHELMSFORD, Mass., Feb. 16, 2010 — With the model 234/302 from McPherson Inc., users can quickly and easily measure vacuum ultraviolet (VUV) spectral emission (signature emission from He, Ar, Xe, N2, O2 and many corrosive fluoride or chloride-based mixtures) in experiments such as plasma process mapping (semiconductor etch plasma formation and distribution), fluorescence (nanomaterials, doped crystals), luminescence (phosphor characteristics) and VUV photoemission. Other applications include fusion plasma diagnostics and high-harmonic-generation experiments. The instrument is available as a VUV scanning monochromator or as a...See full productRelated content from Photonics MediaPRODUCTSPromoted Content March 2024 IssueSpecimONE Spectral Imaging PlatformSeeking a precise, fast, + non-destructive imaging tech that can identify materials invisible to the human eye? Or facing a production line challenge that traditional imaging can't solve? 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