Request InfoFEI, North America NanoPortHILLSBORO, Ore., Aug. 12, 2012 — FEI has launched the Verios extreme-high-resolution scanning electron microscope (SEM), which provides the subnanometer resolution and enhanced contrast needed for precise measurements on beam-sensitive materials in advanced semiconductor manufacturing and materials science applications. When combined with proprietary IC3D software, the Verios provides the precise measurements needed to control processes at the 22-nm technology node and below. 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