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Thin Substrate, Dichroic and Polychroic Thin Film Filters Featuring Flatness <0.1 Waves RMS

Author: Alluxa Engineering Staff
Tuesday, January 22, 2013
The filters used by fluorescence detection systems are arguably the most important element defining the system performance. Alluxa’s new line of thin substrate ultra-flat dichroics and polychroic filters provide improved optical performance, achieve near zero net stress on the primary coated side, and require only a simple AR coating on the back. Eliminating backside compensation lowers costs, improves transmission levels, reduces scatter and improves transmitted wave-front. Flatness levels of < 0.1 waves RMS at 632 for a one inch part are achievable at thicknesses ranging from 0.5mm and above. These new polychroic filters are built with fully dense, hard coated refractory oxides using a proprietary high speed plasma deposition technology purpose built for the challenges presented by the latest optical instruments of the life sciences industry.
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AR coatingdichroic thin film filtersfluorescence detection systemIADIon Assisted Depositionoptical filtersopticsplasma coating processpolychroic thin film filtersultraflat dichroics
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