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TEL, Canon Join on Laser Photolithography Project

Photonics.com
Dec 2001
TOKYO, Dec. 21 -- Tokyo Electron Ltd. (TEL) and Canon Inc. are partnering on 70 nm processes utilizing F2 (157 nm) excimer laser photolithography tools. Current photolithography equipment employs either ArF excimers (193nm) for 110 nm resolution applications or KrF excimer (248 nm) for 130 nm processes.

The companies intend to link TEL's 300 mm coater/developer system with a Canon F2 exposure tool that is to be assembled at Canon's Utsunomiya Optical Products operations to clarify compatibility and other process issues. The partnership also plans to involve manufacturers of photoresist in evaluations and problem-solving initiatives from the standpoint of end-users.



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