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Veeco, Photronics Join on Photomask Technology

Photonics.com
Jan 2002
WOODBURY, N.Y., Jan. 8 -- Veeco Instruments Inc. and Photronics Inc. have formed a strategic relationship to accelerate the development of advanced manufacturing technologies required to fabricate enhanced-reticle and next-generation lithography mask technologies.

The initial phase of the relationship includes the purchase by Photronics of Veeco's Nexus ion beam deposition low-defect density system for deposition of critical films. The companies have also agreed to share technology roadmaps, which is expected to enable Veeco to develop additional process equipment and metrology solutions for applications necessary to expand upon Photronics' sub-wavelength reticle solutions platform of proprietary process technology.



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