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Forum to Focus on System Design, Process Tech Gap

Photonics.com
Aug 2006
LEUVEN, Belgium, Aug. 21, 2006 -- IMEC, a Belgium-based independent nanoelectronics and nanotechnology research center, has announced that registration is open for its annual research review meeting (ARRM), to be held Oct. 22-24 at the Province House in Leuven, Belgium. ARRM06 will examine how to bridge the gap between system design and process technology so that industry can design, develop and manufacture smart devices, subsystems and systems for future markets and applications.

As an international research and development center, IMEC comprises a global research community where next-generation technologies are explored, compared and implemented through collaborative programs. ARRM06 brings industry executives and research managers together with senior IMEC research staff to discuss these technological challenges.

ARRM06 will feature 14 sessions and two thematic events with contributions from both IMEC researchers and industry executives. Discussion topics include semiconductor manufacturing processes, processes beyond CMOS, system design challenges for sub-32-nm technologies, technology-aware-design, design for reliability, advanced packaging and integration issues, technologies for seamless connectivity, emerging embedded platforms, organic devices and power electronics.

This year's ARRM will also include the International Wireless Sensor Network Forum, a half-day event that will examine enabling technologies for intelligent sensor networks, both from a sensor platform and network infrastructure perspective. The event will be supported by Boston University's Sensor Network Consortium.

For more information, visit: www.arrm.be


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