Lithography System Selected
Yale University of New Haven, Conn.
has selected Vistec Lithography Inc.’s EBPG5000plus electron-beam lithography
system for its future nanotechnology research programs. As part of the Yale Institute
for Nanoscience and Quantum Engineering, it will encourage multidisciplinary research
involving the university’s faculty, students and worldwide research partners.
The company, of Watervliet, N.Y., is a provider of electron-beam lithography equipment
based on shaped beam technology.
- 1. A bundle of light rays that may be parallel, converging or diverging. 2. A concentrated, unidirectional stream of particles. 3. A concentrated, unidirectional flow of electromagnetic waves.
- The use of atoms, molecules and molecular-scale structures to enhance existing technology and develop new materials and devices. The goal of this technology is to manipulate atomic and molecular particles to create devices that are thousands of times smaller and faster than those of the current microtechnologies.
MORE FROM PHOTONICS MEDIA