OYAMA, Japan, Oct. 1, 2013 — Lithography light source manufacturer Gigaphoton Inc. has developed a high-power CO2
drive laser for extreme-ultraviolet (EUV) light sources with Mitsubishi Electric Corp., the company announced Monday. The laser demonstrated an average output level of 15 W, which is sufficient for production and represents another step toward realizing production-level EUV light sources, the companies said.
“This also demonstrates progress towards realizing our vision for a green, environmentally friendly LPP [laser-produced plasma] light source,” said Gigaphoton President and CEO Hitoshi Tomaru. “Our efforts will help to bring the industry closer to realizing EUV lithography scanners for high-volume manufacturing.”
The 15-W EUV light output was confirmed on a prototype EUV light source, the companies said. Initial experiments conducted on the drive laser produced output power of over 20 kW, signifying that a key piece of technology necessary for producing EUV output levels of 250 W — necessary for high-volume manufacturing — has been realized.
For more information, visit: www.gigaphoton.com