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Is CVD the Process Of the Past for the Telecommunication Industry?

Photonics.com
Apr 2001
IRVINE, Calif. April 11 – Simax Technologies announced its new chemical solution gelation (CSG) and chemical solution deposition (CSD) monophase processes, a preview of the Sol-Gel process that it says will replace the complex and expensive chemical vapor deposition (CVD) process for the telecommunication industry. The company claims that these state-of-the-art processes will revolutionize the process of making silica materials and components by accelerating development and enhancing the performance of optical network elements and optical fibers.
    Simax's CSG process gives the network industry the opportunity to apply pure silica components with precise geometries, controlled refractive-index profile, superior light propagation and ultra-low OH levels at reduced cost. The copany says that the process also lowers optical layering cost and provides the opportunity to develop singlemode, multimode, plastic coated silica and specialty fibers, and extends the industry's optical horizon by having the opportunity to have multicomponent and aspheric lenses without cutting, grinding and multiple polishing.


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