Request InfoJEOL USA Inc.By combining the SMI2000MS series focused ion beam (FIB) tool from Seiko and the JEM-2500SE scanning transmission electron microscope from JEOL USA Inc., the two companies have developed a high-throughput technique for preparing cross-sectional samples and imaging features smaller than 90 nm. Without destroying the wafer, the fully automated FIB prepares and finalizes multipoint specimens at specified locations on 200- or 300-mm wafers. A gallium-ion beam converts the specified cross section into a 100-nm layer. 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