Cymer Inc. has announced the XLA 105 argon-fluoride excimer light source, which supports 65-nm photolithography applications. It operates at a 4-kHz repetition rate, outputs at 40 W and provides full imaging capability for 200- and 300-mm lithography scanners. Bandwidth is ≤0.2 pm FWHM and ≤0.50 pm at 95% energy integral, enabling exposure of important semiconductor features with high-numerical-aperture lens designs, and requiring fewer calcium-fluoride elements. Pulse duration is ≥70 ns, which reduces peak fluence for longer scanner optics lifetimes. The device is based on proprietary master oscillator power amplifier technology with dual gas discharge chambers.