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THIN-FILM METROLOGY

Photonics Spectra
Jan 2005
KLA-Tencor (See Lam Research Corp.)Request Info
 
The SpectraFX 200 thin-film metrology system for cost-effective production control at the 65-nm node and below has been released by KLA-Tencor. Incorporating proprietary spectroscopic ellipsometry technology, the device features a 150 SE option for qualification and monitoring of ultrathin ONO layers, nitrided films, high- and low-k dielectrics, 193-nm antireflection coating layers, as well as SOI, strained silicon and SiGe substrates. It uses dielectric pattern metrology to enable highly accurate, robust and nondestructive measurements of in-die process variation on product wafers. The metrology system also can be used to monitor 300-mm thin-film processes in production.


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