Request InfoJEOL USA Inc.PEABODY, Mass., July 16, 2007 -- JEOL USA's new high resolution direct-write e-beam lithography system complements its line of spot beam, vector scan systems and mask production tools. The new JBX-5500FS direct-write lithography tool writes patterns at a minimum linewidth of 10 nm at 50 kV on up to 100-mm substrates. The PC-controlled operating platform features a simple graphical user interface for pattern design and machine control. "We are especially pleased to be able to offer this new lithography product during our 40th anniversary since the introduction of the first JEOL e-beam system," said Zane Marek, JEOL...See full productRelated content from Photonics MediaPRODUCTSPhotonics.com 5/3/2023Industrial Inspection Monocular Zoom MicroscopeThe Model ZMM-1 industrial inspection monocular zoom microscope from Titan Tool Supply Inc. is designed to provide manufacturers of smaller components and materials with reliable, accurate, real-time...Photonics Spectra October 2023 IssueUltraviolet Nanosecond-Pulse LaserThe Spectra-Physics® Talon® Ace™ UV100 from MKS Instruments Inc. is a >100-W UV nanosecond laser. 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