Thermo Fisher Scientific Inc. has announced the ECO 3500 Fourier transform infrared metrology system, which integrates easily into automated wafer handling facilities. It incorporates a spectrometer, enhanced analytical software and a software interface that provides full SEMI E95-compliant access for process engineering, research and production-monitoring applications. Two in-line load ports and a high-precision edge grip stage improve wafer handling capabilities, accuracy and repeatability. The system uses an air-cooled infrared source and a beamsplitter mounted in a purged housing. It performs ppm-level measurement of carbon and oxygen in silicon, weight percent level measurement of dielectric films, and compositional analysis of hydrogen in silicon nitride and oxygen nitride films.