Rigaku Americas Corp. has unveiled the Ultima IV x-ray diffractometer, an instrument suitable for materials science and for semiconductor and nanotechnology research. The features include a high-speed detector, application flexibility and a low sample-stage height in an 1100 × 810 × 1630-mm design. Equipped with a Cross Beam Optics mechanism, the device enables users to switch between focusing and parallel incident x-ray beams without resetting the optical system. Geometries are mounted permanently and aligned for simple application changes. A modular buildup platform allows users to increase capabilities as needs arise. Support for high-resolution diffraction, thin-film measurement, microdiffraction and the handling of very small samples can be added.