CHELMSFORD, Mass., Feb. 16, 2010 — With the model 234/302 from McPherson Inc., users can quickly and easily measure vacuum ultraviolet (VUV) spectral emission (signature emission from He, Ar, Xe, N2, O2 and many corrosive fluoride or chloride-based mixtures) in experiments such as plasma process mapping (semiconductor etch plasma formation and distribution), fluorescence (nanomaterials, doped crystals), luminescence (phosphor characteristics) and VUV photoemission. Other applications include fusion plasma diagnostics and high-harmonic-generation experiments. The instrument is available as a VUV scanning monochromator or as a spectrometer/VUV spectral camera with microchannel plate or sensitive, cooled, scientific-grade CCD detectors, and multiport flexibility enables it to be set up as both simultaneously. The compact 200-mm focal length spectrometer has adjustable slits and operates at f/4.5, providing fast, sensitive data collection from ultraviolet radiation and emission spectra in the 100- to 190-nm wavelength range simultaneously, in near real time and with subnanometer spectral resolution. The optical system is aberration-corrected. The working distance between slits is 229 mm, and the angle between the entrance and exit beams is 64° or, optionally, 180°. Grating size is 40 × 45 mm. The contaminant-free finish enables rapid pump down and insures a clean operating environment. The grating can be tuned to longer or shorter wavelengths to collect different wavelength swaths. Various models of cooled, back-illuminated and windowless sensors fit directly to the focal plane for direct detection of VUV spectra. Shipped with a spectral calibration certificate, the spectrometer is available with standard light sources, reflective condenser optics and vacuum differential sections. Measuring 330.2 × 330.2 × 254 mm and weighing 11,340 g, it can be fixed to a vacuum plasma physics experiment or to a larger instrument as a predisperser or variable filter.