PEABODY, Mass., July 19, 2011 — A 200-kV transmission electron microscope (TEM) manufactured by JEOL USA Inc. performs high-throughput nanoanalysis for process and quality control of mass-produced semiconductor and materials samples. The multifunction JEM-2800 features high-resolution imaging in TEM, scanning TEM (STEM) and scanning electron modes; ultrasensitive elemental mapping with a large-angle energy-dispersive spectrometer; electron energy loss spectroscopy for chemical analysis; critical dimension analysis; tomography; and in situ observation of samples. The microscope functions without the use of the traditional fluorescent screen on the electron column. It speeds specimen observation through fully automatic functions including adjustment of focus, astigmatism, contrast, brightness, height and crystal zone axis alignment. Switching between analysis modes is seamless, and quick data collection shortens turnaround time between samples. An operator navigation system and an on-screen operating guide make the instrument a high-throughput, user-friendly TEM for any skill level. Additional features include a Schottky field-emission electron gun, a highly stable eucentric side-entry goniometer stage, a magnification range of 100× to 150,000,000× using STEM, 0.1-nm TEM resolution and 0.20-nm bright-field/dark-field STEM resolution.