ArF Immersion Light Source
Feb 2015Cymer Inc.Request Info
SAN DIEGO, Calif., Feb. 24, 2015 — A new ArF immersion light source for semiconductor lithography from Cymer provides improvements in bandwidth, wavelength and energy stability to reduce process variability and increase yield over previous models.
The XLR 700ix enables higher scanner throughput and process stability for 14-nm chip manufacturing and other applications. It offers improvements in wafer critical dimension (CD) uniformity, software enhancements to increase light source predictability, and availability and reduction in helium and power consumption to decrease operating costs.
Cymer has also introduced DynaPulse, a product upgrade that allows OnPulse customers to achieve the same performance improvements standard in the XLR 700ix with their ArF immersion installed base.
XLR 700ix and DynaPulse use the same patented technology to tightly control bandwidth specifications (300±5 fm) and achieve stable on-wafer performance.