Request InfoASMLVELDHOVEN, Netherlands, July 21, 2016 — ASML has announced the TWINSCAN NXE:3350B extreme UV (EUV) Exposure Tool. More than 1200 wafers per day (wpd) are exposed on the NXE:3350B at a customer site, with peak performance of 1488 wpd. Five customer systems have achieved a four-week average availability of more than 80 percent. The device prepares customers for manufacturing insertion.See full productRelated content from Photonics MediaPRODUCTSBioPhotonics Jul/Aug 2023 IssueCooled sCMOS CamerasXimea’s MJ042MR-GP-P11-BSI-UV model was added to its portfolio of scientific cameras. It’s equipped with a Gpixel PulSar sCMOS sensor that is combined with Peltier cooling and USB3...Photonics Spectra February 2024 IssueFiber-Coupled LEDThe Model X3312 from LumeDEL LLC is a fiber-coupled LED that can be used for applications in spectroscopy as a replacement for halogen lamps. 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