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lithography News
Lambda to Exit Lithography Business
Dec 15, 2004 — SANTA CLARA, Calif., Dec. 15 -- Coherent Inc. announced today that its Lambda Physik subsidiary will discontinue future product development and investments in the semiconductor lithography market. It will continue to support its installed lithography base. As a result of this decision, the company expects to take an after-tax charge of between $3 and $6 million during the first quarter ending Jan. 1, 2005. These charges are primarily related to excessive and obsolete inventories. John Ambroseo,...
Daily News Briefs
Nov 19, 2004 — Mary Jane Hellyar was named president of Eastman Kodak Co.'s Display and Components Group. Hellyar is currently general manager, Film Capture, Digital & Film Imaging Systems and a vice president of the company. She replaces Willy C. Shih, who has...
EUV Source Power Reported Up
Nov 19, 2004 — MIYAZAKI, Japan, Nov. 19 -- Available source power for use in extreme ultraviolet (EUV) lithography has increased significantly in the past year, reaching nearly half the level required for commercial manufacturing by 2009, according to participants...
Schott Researchers Develop New Phase-Shift Material
Jul 1, 2004 — A research and development team in Meiningen, Germany, has developed an advanced phase-shift material for Schott Lithotec AG of Jena, Germany. The material is suitable for 157-, 193- and 248-nm lithography, such as for use in DRAM memory and logic...
Micromirror Technology Enables More Than Projectors
May 1, 2004 — Digital light processing (DLP), which has gained wide acceptance in light modulation for video and data projectors and big-screen high-definition TVs, now enables dozens of emerging applications, including lithography, scientific instrumentation,...
Intel, Cymer Sign EUV Agreement
Jan 26, 2004 — SAN DIEGO & SANTA CLARA, Calif., Jan. 26 -- Intel Corp. announced today an agreement to provide $20 million in funding to Cymer Inc., a supplier of deep ultraviolet (DUV) light sources used in semiconductor manufacturing, over the next three years...
Hinds Instruments Wins Circle of Excellence Award
Jan 1, 2004 — The development of lithography has been hindered by the lack of a deep-ultraviolet tool to measure birefringence in optical materials such as calcium fluoride. Visible measurement has encountered a high level of intrinisic birefringence in CaF2 at...
Microlithography Faces a 157-nm Question
Jan 1, 2004 — When Intel Corp. announced its intention to bypass 157-nm lithography last spring, it raised more questions than it answered for many in the lithography industry. However, it is important to recognize that this decision was most likely based on an...
Future of EUV Lithography Symposium Topic
Oct 20, 2003 — ANTWERP, Belgium, Oct. 20 -- Extreme ultraviolet lithography (EUVL) is well on its way to commercialization, but several critical issues must be addressed to keep the technology on track, said experts at the second International EUVL Symposium, held...
Coherent Acquires Lambda Physik AG
Aug 15, 2003 — SANTA CLARA, Calif., August 15 -- Coherent Inc. announced it has completed its tender offer for the outstanding shares of its Lambda Physik AG subsidiary, based in Gottingen, Germany. The offer was made through Coherent’s German holding company,...
Daily News Briefs
Apr 9, 2003 — Agilent Technologies Inc. announced it has launched a Web-based "one-stop shop" for engineers who need electronic design automation (EDA) technical information and support tools. The EEsof Knowledge Center, at www.agilent.com/find/eesof-support,...
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