NanoTech Alliance Tackles EUVL Challenges
ALBANY, N.Y. & VELDHOVEN, Netherlands, Feb. 9, 2010 – Sematech, a global consortium of semiconductor manufacturers, and ASML, provider of lithography systems for the chip industry based in The Netherlands, announced they have joined forces at the College of Nanoscale Science and Engineering’s (CNSE) Albany NanoTech Complex.
As a member of the Lithography program, ASML will team with researchers at Sematech to advance EUV (extreme ultraviolet) lithography technology and its associate infrastructure components, including mask defect reduction,...