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Spectroscopy News
Process Control System Produces High Laser Yields
Nov 1, 1996 — ENDICOTT, N.Y. -- A novel process-monitoring and -control system has produced excellent semiconductor laser wafer yields, according to the president of a company that has licensed the technology from the US government. Semiconductor Laser...
System Uses Diffuse Reflectance Spectroscopy to Gauge Wafer Temperature
Nov 1, 1996 — SEATTLE -- Researchers from the University of Washington and the University of British Columbia have developed a noninvasive instrument for precisely measuring the temperature of a semiconductor substrate in real-time. Using a technique called...
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