AUSTIN, Texas & ALBANY, N.Y., Feb. 7 -- The University at Albany (UAlbany) and International SEMATECH (ISMT), a consortium of semiconductor manufacturers, have completed negotiations on a joint five-year program to accelerate the development of next-generation lithography. Under the contract, ISMT will conduct a program in extreme ultraviolet (EUV) lithography infrastructure, focused on advanced work in three areas -- mask blanks, resist and EUV extensions -- at UAlbany's new 300 mm wafer cleanroom complex. The program is being called International SEMATECH North. With the construction of two...Read full articleRelated content from Photonics MediaArticlesMultispectral Terahertz Imaging System Incorporates Neural NetworkResearchers at UCLA have developed a focal plane array (FPA) capable of supporting real-time multispectral terahertz (THz) video in 3D. 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