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Plasma Source Enables High-Volume Manufacturing with EUV Lithography

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Phil Alibrandi, Gigaphoton USA Inc.

As the lithography capital equipment sector moves toward early field deployment of extreme-ultraviolet (EUV) scanners and support, the 13.5-nm EUV energy source continues to be a key factor in the ultimate adoption and economic success of the technology. Given the high price of capital equipment...Read full article

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