Photonics ProductsOptics & Optical FabricationOptical Fabrication AccessoriesPolishing Material and Pads

HASTILITE Ceria-Base Polish

  • Company: Universal Photonics Inc.
  • Type: Polishing Material and Pads
  • pH: 6 - 7
  • Particle Count D50 (μm): 0.4 - 0.7
  • PO Density (g/mL): 1.50 - 1.68
  • PO ULTRA Density (g/mL): 1.50 - 1.57
  • PO Solid Content: 40 - 50
  • PO ULTRA Solid Content: 40 - 44

HASTILITE PO and HASTILITE PO ULTRA meet stringent optics specifications with 90% APS < 1.0 µm. High ceria-base yields sleek-free finishes on softer glass, while producing extremely low scatter on harder glass and ceramic materials. PO and PO ULTRA’s versatility addresses high speed polishing needs in a wide variety of polishing systems, including super-polishing, pitch polishing or LP pad polishing.
HASTILITE Ceria-Base Polish

Universal Photonics Inc.
85 Jetson Lane
Central Islip, NY 11722
United States
Phone: +1 516-935-4000
Fax: +1 516-935-4039
Toll-free: +1 800-645-7173
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