Definition of epitaxial equipment

BAE Systems Sensor Solutions - Fairchild - Thermal Imaging Solutions 4/24 LB

Photonics Dictionary

epitaxial equipment: Epitaxial equipment refers to a set of specialized tools and systems used in the process of epitaxy, which is the growth of crystalline layers on a substrate material. Epitaxial growth is a critical process in semiconductor manufacturing, allowing the precise deposition of thin films with controlled properties onto semiconductor substrates.

epitaxial equipment suppliers →

Key features and components of epitaxial equipment include:

Growth chambers: Epitaxial equipment typically consists of one or more growth chambers or reactors where epitaxial deposition takes place. These chambers provide controlled environments with precise temperature, pressure, and gas composition to facilitate the growth of high-quality thin films.

Substrate handling systems: Epitaxial equipment includes mechanisms for loading and unloading semiconductor substrates into the growth chambers. Substrates are typically held on sample holders or wafer carriers, which can be manipulated automatically or manually to ensure proper positioning during the epitaxial growth process.

Precursor delivery systems: Epitaxial growth involves the introduction of precursor gases or vapor-phase reactants into the growth chamber, which react on the substrate surface to form the desired thin film. Epitaxial equipment includes gas delivery systems, mass flow controllers, and vaporization systems to precisely control the flow rates and compositions of precursor gases.

Temperature control systems: Temperature is a critical parameter in epitaxial growth, as it influences the rate and quality of film deposition. Epitaxial equipment is equipped with temperature control systems, such as resistive heaters, thermal radiation sources, or water-cooled stages, to maintain precise and uniform substrate temperatures throughout the growth process.

Pressure control systems: Epitaxial reactors operate under controlled pressure conditions to optimize film growth and prevent gas-phase reactions or particle contamination. Pressure control systems, including vacuum pumps, throttle valves, and pressure gauges, are used to regulate the pressure inside the growth chamber.

In-situ monitoring and control systems: Epitaxial equipment often includes in-situ monitoring and control systems for real-time characterization and adjustment of epitaxial growth parameters. Techniques such as spectroscopic ellipsometry, reflectometry, and mass spectrometry may be used to monitor film thickness, composition, and quality during deposition.

Safety and exhaust systems: Safety features and exhaust systems are essential components of epitaxial equipment to ensure safe operation and proper handling of hazardous precursor gases or by-products generated during epitaxial growth.

Epitaxial equipment is used in the fabrication of advanced semiconductor devices such as integrated circuits (ICs), light-emitting diodes (LEDs), solar cells, and photonic devices. By enabling precise control over thin film deposition, epitaxial equipment plays a crucial role in achieving the desired performance, reliability, and scalability of semiconductor devices for a wide range of applications in electronics, telecommunications, energy, and optoelectronics.