Photonics Dictionary

Ion-beam sputtering (IBS) is a physical vapor deposition (PVD) technique used for depositing thin films onto substrates. It involves bombarding a target material with a beam of energetic ions,...

In the context of thin film deposition processes such as evaporation or sputtering, masks are used to selectively deposit material onto substrates, creating patterns or structures with precise...

Plasmon ion-assisted deposition (PIAD) is a technique used in thin-film deposition processes, particularly in the production of optical coatings. This method combines two key processes: plasmon...

A vacuum deposition method in which the coating material (target) is removed from the surface of the coating source (cathode) by ion bombardment and deposited upon the substrates.

Sputtering equipment is machinery used in the process of physical vapor deposition (PVD), specifically sputtering. Sputtering is a method of depositing thin films of material onto a substrate surface...

A sputtering target is a solid material used in the process of physical vapor deposition (PVD), specifically sputtering. Sputtering targets are typically made of metals, metal alloys, or compounds...

Thin-film deposition equipment refers to machinery and tools used in the process of depositing thin layers of material onto a substrate surface. This technique is commonly employed in various...