Request InfoEnergetiq Technology Inc.Energetiq Technology Inc. has announced its EQ-10HP 20-W extreme-ultraviolet (EUV) light source for actinic inspection of EUV masks. It operates at substantially higher input powers than its EQ-10 series predecessors and delivers 20 W of in-band EUV into 2 pi steradians. Its small, stable, inductively driven plasma makes it suitable for use in EUV metrology and inspection applications, and its modular design facilitates integration into a process tool. The system includes the proprietary and patented Electrodeless Z-pinch source assembly, vacuum and gas subsystems, a power...See full productRelated content from Photonics MediaPRODUCTSPhotonics.com 4/21/2023Optical Metrology SoftwareThe Mx 9.1 software from Zygo Corp. integrates acquisition and data analysis for surface topography and wavefront data. 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