Atomic Layer Deposition System
VILNIUS, Lithuania, July 28, 2023 — The PlasmaPro ASP high-rate atomic layer deposition (ALD) research system from Oxford Instruments is designed for quantum technology and advanced R&D.
The system features a patented remote plasma source design, optimized chamber geometry, and wafer stage bias for ion energy control, resulting in a fast atomic layer deposition rate, low resistivity, and high critical temperature superconducting nitride films. Its initial application focus is quantum technology.
Oxford Instruments Plasma Technology Ltd.