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EUV News
Photon Sieves Prove to be Pivotal to NASA's Heliophysics Studies
GREENBELT, Md., Dec. 15, 2023 — A pair of precision-orbiting small satellites will attempt to capture the first views ever of small-scale features near the surface of the sun that scientists believe drive the heating and acceleration of solar wind. According to Doug Rabin, a heliophysicist at NASA’s Goddard Space Flight Center, photon sieves, a technology that can focus extreme-ultraviolet (EUV) light, are expected to be able to resolve features on the sun 10 to 50 times smaller than what can be seen today with
$10B Earmarked for Extreme-UV Lithography Center
ALBANY, N.Y., Dec. 13, 2023 — A high-numerical aperture extreme-ultraviolet (NA EUV) lithography center is set to be built at the NanoTech Complex semiconductor research facility in Albany, N.Y. The state of New York partnered with IBM, Micron, Applied Materials, and Tokyo...
Compact Accelerator Achieves a Major Energy Milestone
AUSTIN, Texas, Dec. 4, 2023 — A compact particle accelerator developed by the University of Texas at Austin, several national laboratories, and the Texas-based company TAU Systems has produced an electron beam with an energy of 10 billion electron volts (10 GeV). The...
ASML to Appoint Christophe Fouquet President and CEO
VELDHOVEN, Netherlands, Dec. 1, 2023 — The supervisory board of ASML intends to appoint Christophe Fouquet, currently ASML’s chief business officer and member of the board of management, as the company’s next president and CEO. The appointment is subject to notification of...
Hybrid Photoresist Helps Meet Demand for Smaller Chips
UPTON, N.Y., Nov. 14, 2023 — To achieve performance gains in microelectronics, semiconductor size continues to shrink, with feature sizes now in the sub-10-nm range. The challenges associated with the extreme downscaling of semiconductors have led to the adoption of a powerful...
Intel Sells Minority Stake in IMS Nanofabrication
SANTA CLARA, Calif., June 22, 2023 — Intel will divest an approximately 20% stake in its IMS Nanofabrication GmbH business to Bain Capital in a transaction that values IMS at approximately $4.3 billion. The transaction is expected to close in the third quarter of 2023. IMS will operate...
Dark Autoionizing States Enhance EUV Laser Power
QUEBEC CITY, April 27, 2023 — Researchers led by Tsuneyuki Ozaki and François Légaré at the Institut national de la recherche scientifique (INRS) in Quebec have developed a method that could bring extreme ultraviolet (EUV) femtosecond lasers out of...
Semiconductor Leaders Deploy NVIDIA Computational Lithography
SANTA CLARA, Calif., March 23, 2023 — According to NVIDIA, the computing company’s cuLitho software library for computational lithography is being integrated by leading players in the semiconductor industry. The technology serves to accelerate design and manufacturing of...
Virtual Semiconductor Fab Reduces Manufacturing Carbon Footprint
LEUVEN, Belgium, March 9, 2023 — Imec has developed a virtual fab model that the Belgium-based research and innovation hub said enables it and its partners to assess current manufacturing choices, identify areas of focus, and project the future in semiconductor manufacturing. Imec...
Pump-Probe Spectroscopy Could Help to Control Chiral Molecules
BERLIN, Dec. 30, 2022 — An international research team at Freie Universität Berlin, in collaboration with colleagues at the DESY research center, Kiel University, and Kansas State University, has proposed a quantum-chemical calculation-based approach to induce and...
Interferometric Method Measures Interactions at Zeptosecond Speed
NATHAN, Australia, Dec. 16, 2022 — According to researchers at the Australian Attosecond Science Facility and the Centre for Quantum Dynamics of Griffith University, building an interferometer in the extreme ultraviolet (EUV) region is challenging for two reasons. First, it is itself...
NASA Launches Lunar Flashlight: Week in Brief: 12/16/22
WASHINGTON, D.C., Dec. 16, 2022 — NASA’s Lunar Flashlight has communicated with mission controllers and confirmed it is healthy after launching Dec. 11 from Cape Canaveral Space Force Station. The satellite embarked on a four-month journey to the moon to seek out surface water...
Partnership Streamlines EUV Dry Resist Tech Chemical Supply Chain
SAN FRANCISCO, July 26, 2022 — A partnership unveiled this month at SEMICON WEST 2022 aims to provide semiconductor manufacturers with reliable access to precursor chemicals for dry photoresist technology for EUV lithography. Lam Research Corp. will work with Entegris Inc. and...
Four-wave Mixing Approach Generates Narrowband EUV Light with Laser
BERLIN, Jan. 26, 2021 — A method of modifying the spectral width of extreme ultraviolet light (EUV) has been developed by researchers at the Max Born Institute for Nonlinear Optics and Short Pulse Spectroscopy. The scientists used a novel phase-matching scheme in four-wave...
Partnership to Launch SYLOS3 Laser System
VILNIUS, Lithuania, Dec. 17, 2020 — The Extreme Light Infrastructure Attosecond Light Pulse Source (ELI-ALPS) facility, a European research center aimed at providing the international research community with exceptional laser pulses and secondary sources, and a consortium between...
Collaboration Draws Federal Prize
OBERKOCHEN, Germany, Nov. 27, 2020 — Trumpf, Zeiss, and the Fraunhofer Institute for Applied Optics and Precision Mechanics were awarded the Deutscher Zukunftspreis 2020 (German Future Prize 2020) for their project “EUV Lithography: New Light for the Digital Age.” The...
Researchers Push Boundaries of High-Energy Laser Pulses
QUEBEC CITY, Nov. 20, 2020 — INRS researchers have pushed the boundaries of high-energy laser pulse propagation, with reliance on the observation of high-energy multidimensional solitary states (MDSS), allowing the direct generation of extremely short and intense laser pulses...
TRUMPF Reports 8% Fiscal Year-End Sales Decline
DITZINGEN, Germany, Oct. 14, 2020 — TRUMPF recorded a fiscal year 2019-2020 (ending June 30, 2020) decline in sales revenue of 8%, to €3.5 billion, compared to €3.8 billion for fiscal year 2018-2019. The company’s order intake fell to €3.3 billion, down €0.4...
Obert R. Wood II and Akiyoshi Suzuki Named 2019 Frits Zernike Award Winners
BELLINGHAM, Wash., and SAN JOSE, Calif., March 25, 2019 — Obert R. Wood II and Akiyoshi Suzuki have been recognized by SPIE for outstanding accomplishments in microlithographic technology, especially in furthering the development of semiconductor lithographic imaging solutions. They each received this...
ASML, Imec to Establish a Joint Lab, Accelerate Adoption of EUV Lithography
LEUVEN, Belgium, Nov. 26, 2018 — Research and innovation hub imec and lithographic equipment developer ASML have entered the next stage of their extreme UV (EUV) lithography collaboration. Together, they will accelerate the adoption of EUV lithography for high-volume production,...
Extreme UV Keeps Pace with Moore’s Law
May 30, 2018 — For years, 193-nm immersion lithography enabled foundries to create increasingly smaller features on silicon wafers. The technique involved shining 193-nm light through a patterned surface that cast a pattern onto a blank silicon wafer. But problems...
Extreme UV Sources Fill the Gap
Mar 28, 2018 — The electromagnetic spectrum has several regions where emitters, detectors, or both are not readily available. Terahertz and the far-infrared are prime examples. Even within the visible spectrum, much has been said about the “green gap”...
ASML GainsMinority Stake in Zeiss for EUV Development
VELDHOVEN, Netherlands, Nov. 10, 2016 — Semiconductor supplier ASML Holding NV has announced an acquisition agreement to acquire a 24.9 percent minority stake in optics developer Carl Zeiss AG’s subsidiary Carl Zeiss SMT, for which ASML will pay Zeiss €1 billion ($1.09 billion)...
Ushio, TNO partner for EUV Lithography
TOKYO, Feb. 29, 2016 — Light source manufacturer Ushio Inc. has announced a strategic partnership with the Netherlands Organization for Applied Scientific Research (TNO), aiming at the development of extreme UV lithography for next-generation semiconductor manufacturing....
Gigaphoton Expands with 2 Chinese Support Bases
OYAMA, Japan, Feb. 23, 2016 — Lithography light source manufacturer Gigaphoton Inc. will set up new support bases in the Chinese cities of Dalian and Xiamen to support the region’s semiconductor market. “I believe that the excellent stability, productivity and...
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