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EUV Products
Electron Beam Metrology System
SANTA CLARA, Calif., March 27, 2023 — Applied Materials’ VeritySEM® 10 CD-SEM metrology system is designed to precisely measure the critical dimensions of semiconductor device features patterned with EUV and emerging High-NA EUV lithography. The system architecture enables low landing energy at 2× better resolution compared to conventional CD-SEMs. It also provides a 30% faster scan rate to further reduce interaction with the photoresist and increase throughput. The system’s resolution and scan rate provide...
Applied Materials
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EUV Flat Mirrors
BARRINGTON, N.J., Nov. 12, 2018 — Extreme UV (EUV) Flat Mirrors from Edmund Optics Inc. are precision polished, multilayer devices designed for maximum achievable reflectance at the design wavelength and angle of incidence. The mirrors are designed for EUV beam steering and...
Edmund Optics Inc.
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EUV Exposure Tool
VELDHOVEN, Netherlands, July 21, 2016 — ASML has announced the TWINSCAN NXE:3350B extreme UV (EUV) Exposure Tool. More than 1200 wafers per day (wpd) are exposed on the NXE:3350B at a customer site, with peak performance of 1488 wpd. Five customer systems have achieved a four-week...
ASML
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EUV Lithography System
VELDHOVEN, Netherlands, Oct. 1, 2015 — ASML Holding NV has announced the TWINSCAN NXT:1980Di immersion lithography system to support multiple-patterning performance requirements. A 1.2-nm dedicated chuck overlay and 10-nm focus uniformity are featured, with new grid calibrations...
ASML
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In-Vacuum Mechanical Shutter Systems
BERLIN, July 6, 2015 — Greateyes GmbH now offers fast in-vacuum mechanical shutter systems for vacuum-ultraviolet and extreme-ultraviolet and x-ray cameras equipped with vacuum flanges CFDN100. The shutters protect CCD sensors from high-energy radiation. They close...
greateyes GmbH
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EUV Spectrometer
CHELMSFORD, Mass., Jan. 12, 2009 – McPherson Inc. has released an x-ray and extreme ultraviolet (EUV) spectrometer, the 251MX, for wavelength dispersive spectral measurements from 0.6 to 20 nm (60 to 2000 eV.) The device provides corrected flat-field spectra with its selection of...
McPHERSON
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Laser-Driven Light Source
WOBURN, Mass., May 8, 2008 -- Energetiq Technology Inc. said its new EQ-1000 LDLS (laser-driven light source) is a deep ultraviolet-visible (DUV-VIS) light source that achieves extreme high brightness and power over a broad spectral range, from 170 nm through through visible and...
Energetiq Technology Inc.
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(7 results found)
April 2024
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